Materials Synthesis

  • AJA Ultra-high vacuum sputter deposition system with six magnetron sources in a co-sputtering configuration, 850C substrate temperature, RF/DC substrate bias for combinatorial materials studies and high quality multilayer deposition
  • Electrochemical deposition system based on 273 Potentiostat/Galvanostat from Princeton Applied Research and a Flat Cell
  • Electrochemical deposition system based on Gamry PC4 Potentiostat/Galvanostat
  • Custom built high deposition rate sputter coating system
  • Custom built e-beam evaporator with Advanced Energy Kaufman Ion Source for ion-assisted deposition capabilities