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AJA Ultra-high vacuum sputter deposition system with six magnetron sources in a co-sputtering configuration, 850C substrate temperature, RF/DC substrate bias for combinatorial materials studies and high quality multilayer deposition
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Electrochemical deposition system based on 273 Potentiostat/Galvanostat from Princeton Applied Research and a Flat Cell
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Electrochemical deposition system based on Gamry PC4 Potentiostat/Galvanostat
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Custom built high deposition rate sputter coating system
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Custom built e-beam evaporator with Advanced Energy Kaufman Ion Source for ion-assisted deposition capabilities